| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a gas barrier film excellent in high barrier performance, bending resistance, smoothness, and production suitability, a method of manufacturing the same, and an organic photoelectric conversion element using the same. <P>SOLUTION: In the gas barrier film having a gas barrier layer containing silicon and oxygen at least at one side of a substrate, when the hardness of a substrate surface side (B surface) of the gas barrier layer measured by a nano-indentation method is represented by H1, and the hardness of the opposite surface side (surface A) is represented by H2, the gas barrier film has the hardness ratio (H2/H1) of 1.5 or more to 10.0 or lower and the hardness H2 of the surface A of 2.0 GPa or higher. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
