发明名称 METHOD FOR FORMING METAL OXIDE THIN FILM PATTERN USING NANOIMPRINT AND MANUFACTURING METHOD OF LED ELEMENT USING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide thin film pattern using a nanoimprint and the manufacturing method of an LED element using the same. <P>SOLUTION: The method for forming the metal oxide thin film pattern using the nanoimprint comprises the steps of: forming a photosensitive metal-organic precursor layer 30 on a substrate 10; preparing a mold 20; pressurizing the photosensitive metal-organic precursor layer 30 by the mold 20; forming a hardened metal oxide thin film pattern 31 by heating the pressurized layer or irradiating the pressurized layer with ultraviolet rays simultaneously with the heating; and removing the mold 20 from the metal oxide thin film pattern 31, wherein a step of selectively burning the metal oxide thin film pattern 31 is further comprised. Thus, a process for separately applying ultraviolet resin in order to use the resin as resist is omitted, thereby simplifying a pattern formation process and forming micro/nano complex patterns through a single imprint process. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011146661(A) 申请公布日期 2011.07.28
申请号 JP20100027450 申请日期 2010.02.10
申请人 KOREA INST OF MACHINERY &amp, MATERIALS 发明人 PARK HYEONG HO;JEONG JUN HO;KIM KI DON;CHOI DAE GEUN;CHOI JUN HYUK;LEE JI HYE;LEE SOON WON
分类号 H01L21/027;B29C59/02;G03F7/20 主分类号 H01L21/027
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