发明名称 DEFECT OBSERVATION METHOD AND DEFECT OBSERVATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a defect observation device which inputs a training defect and ideal output that is based on image processing of the training defect, and which can readily and rapidly set image processing parameters required for the classification of the defect type. SOLUTION: The defect observation device includes: an input/output unit 123 which inputs training defect information and information about the ideal output of the training defect, and displays a processing result that is based on a determined image processing parameter set; and an automatic determination unit 124 which selects from among all of the image processing parameter sets, a smaller number of image processing parameter sets than the total number of all of the image processing parameter sets, calculates an image processing result that is based on the image processing parameter sets selected for the defect image that has been input, calculates the degree of agreement of the selected image processing parameter sets, estimates the distribution of index values in all of the image processing parameter sets from the distribution of the degree of agreement of the selected image processing parameter sets, and determines the image processing parameter sets having a high degree of agreement from among all of the image processing parameter sets. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011145275(A) 申请公布日期 2011.07.28
申请号 JP20100148486 申请日期 2010.06.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MINEKAWA YOHEI;NAKAGAKI AKIRA;NAKAHIRA KENJI;HIRAI TOMOHIRO;KITAHASHI KATSUHIRO
分类号 G01N23/225;G06T1/00;H01L21/66 主分类号 G01N23/225
代理机构 代理人
主权项
地址