发明名称 |
METHOD FOR FLATTENING SURFACE AND METHOD FOR PRODUCING OPTICAL ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To measure surface roughness in real time while performing near-field light etching. SOLUTION: An optical element 2 located in a raw material gas atmosphere is irradiated with light having a longer wavelength than the absorption-end wavelength of a gas molecule in a raw material gas and then a corner part is etched by dissociating the raw material gas based on near-field light emitted at least on the corner part of unevenness formed on the surface of the optical element 2. A laser beam for measuring surface roughness is irradiated onto the surface of the optical element 2 while etching, the strength of scattered light where the laser beam is scattered on the surface of the optical element 2 is measured and then the surface roughness is measured by etching the corner based on the measured strength of the scattered light. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2011144052(A) |
申请公布日期 |
2011.07.28 |
申请号 |
JP20100003796 |
申请日期 |
2010.01.12 |
申请人 |
SIGMA KOKI KK |
发明人 |
HIRATA KAZUYA;TABATA YOSHINORI |
分类号 |
C03C15/00;G01B11/30;G02B3/00 |
主分类号 |
C03C15/00 |
代理机构 |
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