发明名称 METHOD FOR FLATTENING SURFACE AND METHOD FOR PRODUCING OPTICAL ELEMENT
摘要 PROBLEM TO BE SOLVED: To measure surface roughness in real time while performing near-field light etching. SOLUTION: An optical element 2 located in a raw material gas atmosphere is irradiated with light having a longer wavelength than the absorption-end wavelength of a gas molecule in a raw material gas and then a corner part is etched by dissociating the raw material gas based on near-field light emitted at least on the corner part of unevenness formed on the surface of the optical element 2. A laser beam for measuring surface roughness is irradiated onto the surface of the optical element 2 while etching, the strength of scattered light where the laser beam is scattered on the surface of the optical element 2 is measured and then the surface roughness is measured by etching the corner based on the measured strength of the scattered light. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011144052(A) 申请公布日期 2011.07.28
申请号 JP20100003796 申请日期 2010.01.12
申请人 SIGMA KOKI KK 发明人 HIRATA KAZUYA;TABATA YOSHINORI
分类号 C03C15/00;G01B11/30;G02B3/00 主分类号 C03C15/00
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