发明名称 REDUNDANT ANODE SPUTTERING METHOD
摘要 A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.
申请公布号 US2011180390(A1) 申请公布日期 2011.07.28
申请号 US201113080244 申请日期 2011.04.05
申请人 VON ARDENNE ANLAGENTECHNIK GMBH 发明人 TESCHNER GOETZ;MILDE FALK;MIRRING ENNO;MEISSNER FRANK;GROSSER GOETZ
分类号 C23C14/35 主分类号 C23C14/35
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