METHOD FOR FORMING IMAGE IN DEEP ULTRAVIOLET PHOTORESIST WITH TOP COAT, AND MATERIALS THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a method for forming an image in a deep ultraviolet photoresist with a top barrier coat to prevent the photoresist form being contaminated by environmental contaminants.

SOLUTION: The method is for forming the image of the deep ultraviolet photoresist by using: a top coat composition for a deep uv immersion lithography including a polymer with at least one ionizable group having a pKa ranging from about -9 to about 11; and top coat.

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