| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold for optical imprint which can be observed with an SEM (Scanning Electron Microscope), can be inspected with high throughput, and can form high-definition pattern, and to provide an optical imprint method using the same. SOLUTION: The mold 1 for optical imprint includes a transparent base 2, a transparent conductive pattern layer 4 positioned on one surface 2a of the transparent base 2 and having a desired unevenness structure, a transparent conductive reverse-surface layer 7 positioned on the other surface 2b of the transparent base 2, and a top-reverse connection member 8 electrically connecting the transparent conductive pattern layer to the transparent conductive reverse-surface layer. COPYRIGHT: (C)2011,JPO&INPIT |
