发明名称 SYSTEMS AND METHODS FOR SUBSTRATE FORMATION
摘要 Templates for patterning large area substrates are provided. Generally, templates include a body and a plurality of molds positioned on the body. Each mold has a first length and each mold may be separated by an open space having a distance therebetween. The length of the mold may be substantially similar to the distance between the open space or the length of the mold may be substantially greater than the distance between the open space. Additionally, purging techniques that incorporate features of the template are described.
申请公布号 US2011180964(A1) 申请公布日期 2011.07.28
申请号 US20110987196 申请日期 2011.01.10
申请人 MOLECULAR IMPRINTS. INC. 发明人 CHOI BYUNG-JIN
分类号 B29C59/02 主分类号 B29C59/02
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