发明名称 |
Photolithography Mask, Blank Photomask, Reflective Photomask, and Methods of Manufacturing the Same |
摘要 |
Photolithography masks include an optically transparent substrate having a plurality of fiducial position aligning marks on sidewalls thereof. A reflective layer is also provided on an upper surface of the optically transparent substrate. The reflective layer includes a composite of a lower reflective layer of a first material and an upper reflective layer of a second material different from the first material, on the lower reflective layer. The lower reflective layer may include molybdenum and the upper reflective layer may include silicon. An anti-reflective layer is provided on the reflective layer.
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申请公布号 |
US2011183239(A1) |
申请公布日期 |
2011.07.28 |
申请号 |
US20100963064 |
申请日期 |
2010.12.08 |
申请人 |
PARK CHANG-MIN;PARK JOO-ON;YEO JEONG-HO |
发明人 |
PARK CHANG-MIN;PARK JOO-ON;YEO JEONG-HO |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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