发明名称 GAN-GROUP SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a GaN group semiconductor light-emitting element including an active layer containing In and reducing a quantum efficiency in a large injection current state, and also to provide a method for manufacturing the GaN group semiconductor light-emitting element. <P>SOLUTION: The GaN group semiconductor light-emitting element 11a is equipped with: a substrate 13 composed of a GaN group semiconductor and having a main surface 13a inclined from a surface (c) at an inclination angle &alpha; included in a range of not less than 63&deg; and less than 80&deg; in a direction of an axis (m); a GaN group semiconductor epitaxial region 15; an active layer 17; an electronic block layer 27; and a contact layer 29. The active layer 17 is composed of a GaN group semiconductor containing In, and the dislocation density of the substrate 13 is 1&times;10<SP>7</SP>cm<SP>-2</SP>or less. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011146650(A) 申请公布日期 2011.07.28
申请号 JP20100008384 申请日期 2010.01.18
申请人 SUMITOMO ELECTRIC IND LTD 发明人 SHIOYA YOHEI;KYONO TAKASHI;SUMITOMO TAKAMICHI;AKITA KATSUSHI;UENO MASANORI;NAKAMURA TAKAO
分类号 H01L33/32;H01S5/34 主分类号 H01L33/32
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