发明名称 DEFECT INSPECTING DEVICE AND DEFECT INSPECTING METHOD
摘要 <p>Disclosed is a defect inspecting device capable of improving efficiency in setting a spatial filter (45) and, at the same time, capable of automatically setting the spatial filter. An image of a surface of a spatial filter is acquired using an observing camera (88) in a state where a variable field stop (81) is closed down. The image is classified into a plurality of groups in accordance with the brightness level of bright spots of diffracted light. The spatial filter is set so as to shield the group with the highest brightness level, and an observed image is acquired. It is determined whether or not a repeating pattern remains in the acquired image, and, when it is determined that a repeating pattern remains, the setting of the spatial filter (45) is changed such that the spatial filter can shield the group with the second highest brightness level in addition to the group that is already shielded. The same process is repeated until it is determined that no repeating pattern remains and the setting of the spatial filter (45) is finished.</p>
申请公布号 WO2011089829(A1) 申请公布日期 2011.07.28
申请号 WO2010JP73558 申请日期 2010.12.27
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION;SHIMURA KEI 发明人 SHIMURA KEI
分类号 G01N21/956 主分类号 G01N21/956
代理机构 代理人
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