发明名称 POLYACETAL RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a polyacetal resin composition excellent in suppression of formaldehyde generation, repeated impact resistance, and dimensional stability, after held at high temperature and high humidity. SOLUTION: This polyacetal resin composition is obtained from a raw material composition which includes a polyacetal resin, a first hydrazine derivative (B), and a hydrazine derivative (C) different from the first hydrazine derivative, wherein the mixture of the first hydrazine derivative (B) and the hydrazine derivative (C) different from the first hydrazine derivative does not show a melting point, when it is heated at a rate of temperature rise of 2.5°C/min using a differential scanning calorimeter; held for 2 min after melted; cooled to 100°C at a rate of 10°C/min; and thereafter heated at a rate of temperature rise of 2.5°C/min. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011144242(A) 申请公布日期 2011.07.28
申请号 JP20100005207 申请日期 2010.01.13
申请人 ASAHI KASEI CHEMICALS CORP 发明人 IWAMOTO TAKASHI
分类号 C08L59/00;C08K5/24 主分类号 C08L59/00
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