AN EVAPORATOR FOR VACUUM THERMAL EVAPORATION

摘要

PURPOSE: An evaporation source for a deposition process is provided to enhance the thickness uniformity of a film deposited on a wide area of a substrate and the distribution uniformity of dopant. CONSTITUTION: An evaporation source for a deposition process comprises a plurality of crucibles(200), a joining unit and a jetting unit(100). The crucibles hold materials. The crucibles are screwed to the joining unit. The jetting unit is connected to the joining unit. The jetting unit comprises a plurality of evaporation pipes. The evaporation pipes are formed in two groups. A first group of evaporation pipes slope to the left or right from the vertical direction. A second ground of evaporation pipes are installed in horizontally symmetrical to the first group of evaporation pipes.