发明名称 PHYSICAL VAPOR DEPOSITION REACTOR WITH CIRCULARLY SYMMETRIC RF FEED AND DC FEED TO THE SPUTTER TARGET
摘要 In a PVD reactor having a sputter target at the ceiling, a conductive housing enclosing the rotating magnet assembly has a central port for the rotating magnet axle. A conductive hollow cylinder of the housing surrounds an external portion of the spindle. RF power is coupled to a radial RF connection rod extending radially from the hollow cylinder. DC power is coupled to another radial DC connection rod extending radially from the hollow cylinder.
申请公布号 KR20110084948(A) 申请公布日期 2011.07.26
申请号 KR20117011118 申请日期 2009.10.02
申请人 APPLIED MATERIALS, INC. 发明人 HAWRYLCHAK LARA
分类号 H01L21/203 主分类号 H01L21/203
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