发明名称 Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device
摘要 The present invention relates to a film formation apparatus including a first transfer chamber having a roller for sending a substrate, a film formation chamber having a discharging electrode, a buffer chamber provided between the transfer chamber and the film formation chamber or between the film formation chambers, a slit provided in a portion where the substrate comes in and out in the buffer chamber, and a second transfer chamber having a roller for rewinding the substrate. The slit is provided with at least one touch roller, and the touch roller is in contact with a film formation surface of the substrate. In addition, the present invention also relates to a method for forming a film and a method for manufacturing a photoelectric conversion device that are performed by using such a film formation apparatus.
申请公布号 US7985664(B2) 申请公布日期 2011.07.26
申请号 US20090627473 申请日期 2009.11.30
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 HIURA YOSHIKAZU;ADACHI HIROKI;TAKAHASHI HIRONOBU;SUGAWARA YUUSUKE;ARAO TATSUYA;NISHI KAZUO;ARAI YASUYUKI
分类号 H01L21/20;C23C16/54 主分类号 H01L21/20
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