| 摘要 |
<p>PURPOSE: A multi-tone photo mask blank, a multi-tone photo mask, and a manufacturing method thereof are provided to simultaneously etch a first semi-transmissive film, a second semi-transmissive film, and a third semi-transmissive film which are formed as the same target, thereby reducing the number of photo mask manufacturing processes. CONSTITUTION: A multi-tone photo mask includes at least two semi-transmissive units on a transparent substrate(11). At least two kinds of semi-transmissive films(31,32,33) have different transmissive rates for exposed light on a transparent substrate. At least two kinds of semi-transmissive films are divided. At least two kinds of semi-transmissive films have different film thicknesses. At least two kinds of semi-transmissive films are made of the same materials whose composition rates are different. At least two kinds of semi-transmissive films are etched by the same etchant or the same etching gas.</p> |
