| 摘要 |
A process for modification of a substrate so as to form an ultrahydrophobic surface on the substrate is provided. Surface-modified substrates that can be formed according to the disclosed processes are also provided. The process includes attachment of a multitude of nano- and/or submicron-sized structures to a surface to provide increased surface roughness. In addition, the process includes grafting a hydrophobic material to the surface in order to decrease the surface energy and decrease wettability of the surface. The combination of increased surface roughness and decreased surface energy can provide an ultrahydrophobic surface on the treated substrate.
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