| 摘要 |
<p>PURPOSE: A mask blank and a method for manufacturing a transferring mask are provided to increase the manufacturing stability and efficiently coat resist by preventing the generation of circle shaped coating defects. CONSTITUTION: A mask blank includes a light shielding film(2) on a transmittance substrate(1). The light shielding film is formed based on metal which is capable of dry-etched using chlorine-based gas. A resist film(4) is used for forming transfer patterns on the light shielding film. An etching mask film(3) is formed on the upper side of the light shielding film. In the etching mask film, transition metal, silicon, and either of nitrogen or oxygen is included. The transition metal of the etching mask film is less than 9%.</p> |
