发明名称 METHOD FOR PRODUCING A SEMICONDUCTOR, AND SEMICONDUCTOR AND ELECTRIC ELEMENT
摘要 The production of a nanoparticulate semiconductor from doped nanoparticles by spark plasma sintering is proposed, thus providing semiconductors having a thickness of more than 90% of the theoretically possible thickness of the solid material. Such semiconductors are used in particular for thermoelectric, photovoltaic or other electronic elements. In particular, also semiconductors having differently doped layers can be produced by layering differently doped particles and sintering the same.
申请公布号 WO2010097228(A3) 申请公布日期 2011.07.21
申请号 WO2010EP01195 申请日期 2010.02.26
申请人 UNIVERSITAET DUISBURG-ESSEN;SCHIERNING, GABI;WIGGERS, HARTMUT;SCHULZ, CHRISTOF;SCHMECHEL, ROLAND 发明人 SCHIERNING, GABI;WIGGERS, HARTMUT;SCHULZ, CHRISTOF;SCHMECHEL, ROLAND
分类号 H01L35/34 主分类号 H01L35/34
代理机构 代理人
主权项
地址