EXPOSURE METHOD, EXPOSURE DEVICE, AND MANUFACTURING METHOD FOR DEVICE

摘要

Disclosed is an exposure method in which: the relationship is derived between a first component of a non-linear distortion generated on a first substrate, said first component being calculated by measuring a first number of alignment marks, and a second component which can be calculated by measuring a second number of alignment marks which is lower than the first number of alignment marks measured; the second number of alignment marks on a second substrate is measured; deformation information for the second substrate is obtained on the basis of the result of the measurement of the second number of alignment marks and the derived relationship between the first component and the second component; and the second substrate is exposed to an exposure beam on the basis of the obtained deformation information.