| 摘要 |
PURPOSE: A wafer unloading bath system is provided to prevent the surface contamination of a wafer by removing seal abrasive particles and shaft abrasive particles. CONSTITUTION: An unloading bath(180) receives washing solutions. A first plate moves a cassette(170) which receives a wafer. A fourth plate(140) is vertically driven to unload the cassette in the unloading bath. The fourth plate is installed outside the unloading bath and is connected to an up and down driving unit(150).
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