发明名称 Metal Oxide Resistance Based Semiconductor Memory Device With High Work Function Electrode
摘要 Various aspect are directed to a memory device or memory cell with a metal-oxide memory element arranged in electrical series along a current path between at least a first electrode, a metal-oxide memory element adjacent to the first electrode, and a second electrode. The first electrode comprises an electrode material having a first work function. The metal-oxide memory element comprises a metal-oxide material having a second work function. The first work function is greater than the second work function. Thermionic emission characterizes the current through this memory.
申请公布号 US2011175050(A1) 申请公布日期 2011.07.21
申请号 US20100878861 申请日期 2010.09.09
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 CHIEN WEI-CHIH;CHEN YI-CHOU
分类号 H01L45/00;H01L21/16 主分类号 H01L45/00
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