发明名称 Semiconductor Device Having Transistor with Vertical Gate Electrode and Method of Fabricating the Same
摘要 A semiconductor device includes transistors with a vertical gate electrode. In a transistor structure, a semiconductor pattern has first and second sides facing in a transverse direction, and third and fourth sides facing in a longitudinal direction. Gate patterns are disposed adjacent to the first and second sides of the semiconductor pattern. Impurity patterns directly contact the third and fourth sides of the semiconductor pattern. A gate insulating pattern is interposed between the gate patterns and the semiconductor pattern.
申请公布号 US2011175153(A1) 申请公布日期 2011.07.21
申请号 US201113075778 申请日期 2011.03.30
申请人 KANG SANG-WOO;HAN JEONG-UK;KIM YONG-TAE;YOON SEUNG-BEOM 发明人 KANG SANG-WOO;HAN JEONG-UK;KIM YONG-TAE;YOON SEUNG-BEOM
分类号 H01L29/788;H01L21/336 主分类号 H01L29/788
代理机构 代理人
主权项
地址
您可能感兴趣的专利