发明名称 THRESHOLD ADJUSTMENT IMPLANTS FOR REDUCING SURFACE RECOMBINATION IN SOLAR CELLS
摘要 Embodiments of the invention relate to methods of forming solar cell devices to reduce recombination losses and solar cell devices made by such methods, for example back contact solar cells, such as emitter-wrap-through (EWT) solar cells. The methods may include disposing an amount of impurities into a charge compensating region formed on a rear surface of a substrate and forming a rear surface passivation layer over at least a portion of the charge compensating region, wherein the amount of the impurities disposed in the charge compensating region is selected to compensate for an amount of charge formed in the rear surface passivation layer.
申请公布号 WO2011035268(A3) 申请公布日期 2011.07.21
申请号 WO2010US49537 申请日期 2010.09.20
申请人 APPLIED MATERIALS, INC.;GEE, JAMES M.;KUMAR, PRABHAT 发明人 GEE, JAMES M.;KUMAR, PRABHAT
分类号 H01L31/042 主分类号 H01L31/042
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