发明名称 WAFER UNLOADING SYSTEM AND WAFER PROCESSING EQUIPMENT INCLUDING THE SAME
摘要 <p>Provided are a wafer unloading system and a wafer processing equipment including the same. The wafer unloading system includes a fluid supply tube for supplying a fluid, a nozzle for injecting the supplied fluid, and an injection hole defined in a plate to allow the injected fluid to reach a space between a polishing pad and a wafer.</p>
申请公布号 WO2011087213(A1) 申请公布日期 2011.07.21
申请号 WO2010KR09011 申请日期 2010.12.16
申请人 LG SILTRON INC.;AHN, JIN-WOO;CHOI, EUN-SUCK;KIM, BONG-WOO;YU, HWAN-SU;YI, JAE-HWAN 发明人 AHN, JIN-WOO;CHOI, EUN-SUCK;KIM, BONG-WOO;YU, HWAN-SU;YI, JAE-HWAN
分类号 H01L21/304;B24B37/34 主分类号 H01L21/304
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