WAFER UNLOADING SYSTEM AND WAFER PROCESSING EQUIPMENT INCLUDING THE SAME
摘要
<p>Provided are a wafer unloading system and a wafer processing equipment including the same. The wafer unloading system includes a fluid supply tube for supplying a fluid, a nozzle for injecting the supplied fluid, and an injection hole defined in a plate to allow the injected fluid to reach a space between a polishing pad and a wafer.</p>
申请公布号
WO2011087213(A1)
申请公布日期
2011.07.21
申请号
WO2010KR09011
申请日期
2010.12.16
申请人
LG SILTRON INC.;AHN, JIN-WOO;CHOI, EUN-SUCK;KIM, BONG-WOO;YU, HWAN-SU;YI, JAE-HWAN