发明名称 ACTUATOR APPARATUS, METHOD OF MANUFACTURING THE SAME, METHOD OF MANUFACTURING LIQUID INJECTION HEAD, AND METHOD OF MANUFACTURING LIQUID INJECTION EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide an actuator apparatus in which reduction in a deflection amount is suppressed, a method of manufacturing the actuator apparatus, a method of manufacturing a liquid injection head using the actuator apparatus, and a method of manufacturing liquid injection equipment. <P>SOLUTION: Since a temperature of a piezoelectric layer 70 containing PZT in forming a first layer 81 of an upper electrode 80 is 250&deg;C or less, generation of an oxygen vacancy of the PZT can be suppressed. When the first layer 81 containing Ir is formed on the piezoelectric layer 70 while the temperature of the piezoelectric layer 70 as a substrate is &le;250&deg;C, a compression stress is generated on the first layer 81. Deflection on an entire piezoelectric element 300 can be eliminated by forming a second layer 82 having a tensile stress on the first layer 81 on which the compression stress is generated. Accordingly, an initial deflection is small, thereby reduction in a deflection amount can be suppressed, wherein the deflection has a convex form due to repeated displacements. Thus, a method of manufacturing an actuator apparatus 310 in which reduction in a displacement amount is suppressed can be obtained. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011142280(A) 申请公布日期 2011.07.21
申请号 JP20100003447 申请日期 2010.01.09
申请人 SEIKO EPSON CORP 发明人 OSAWA EIJI
分类号 B41J2/045;B41J2/055;B41J2/135;B41J2/14;B41J2/16;H01L41/09;H01L41/187;H01L41/22;H01L41/29 主分类号 B41J2/045
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