| 摘要 |
PROBLEM TO BE SOLVED: To evaluate the shape of a pattern with high accuracy and quickly by a simple constitution. SOLUTION: The contour of an evaluation object pattern P2 is detected and the contour of a reference pattern RP2 which has an allowance L given beforehand and is used as an evaluation reference of the pattern P2 is detected. An allowable scope AS2 of the pattern P2 is formed on the basis of the contour of the reference pattern RP2 and the allowance L, and the relative positional relation of the detected contour of the pattern P2 with the allowable scope AS2 is determined. Thereby the inclusive relation of the contour of the pattern P2 and the allowable scope is decided and moreover the quality of the pattern P2 is decided on the basis of the result of the foregoing decision. COPYRIGHT: (C)2011,JPO&INPIT
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