发明名称 Standard Cell Architecture and Methods with Variable Design Rules
摘要 Structures and methods for standard cell layouts having variable rules for spacing of layers to cell boundaries are disclosed. In one embodiment, a first standard cell layout is provided with a conductive layer having at least two portions spaced apart by a minimum spacing distance, the conductive layer having at least one portion spaced from a cell boundary by a first spacing distance of less than half of the minimum spacing distance; a second standard cell disposed adjacent the first standard cell with at least one second portion of the conductive layer in the second cell disposed adjacent the first portion in the first standard cell and spaced apart from a common cell boundary by a second spacing greater than half of the minimum; wherein the sum of the first and second spacings is at least as great as the minimum spacing. A method for forming standard is disclosed.
申请公布号 US2011177658(A1) 申请公布日期 2011.07.21
申请号 US201113074914 申请日期 2011.03.29
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LAW OSCAR M. K.;JOSHI MANOJ ACHYUTRAO;THEI KONG-BENG;CHUANG HARRY
分类号 H01L21/82 主分类号 H01L21/82
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