发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR LIQUID CRYSTAL DEVICE, AND LIQUID CRYSTAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To relatively easily control the feature of a concave portion formed in a substrate for a liquid crystal device. <P>SOLUTION: The method for manufacturing a substrate for a liquid crystal device includes: a resist pattern forming step of forming a resist pattern (230) having a plurality of apertures (231) on a substrate (210); a concave portion forming step of forming a plurality of concave portions on the substrate by etching the substrate by using the resist pattern; an ashing step of ashing the resist pattern so as to expand each of the plurality of apertures; and an etching step of etching the substrate by using the ashed resist pattern (2231') so as to expand each of the plurality of concave portions. By alternately repeating the ashing step and the etching step in several times, each of the plurality of concave portions can be formed into a feature corresponding to an aspheric lens. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011141476(A) 申请公布日期 2011.07.21
申请号 JP20100002851 申请日期 2010.01.08
申请人 SEIKO EPSON CORP 发明人 ITO SATOSHI
分类号 G02F1/1335;G02F1/1333 主分类号 G02F1/1335
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