| 摘要 |
PROBLEM TO BE SOLVED: To solve problems that in a nano-imprint method, accurate alignment between a substrate with an opening formed in the central part such as a disk substrate and a mold is difficult, and alignment accuracy is deteriorated by alignment mark damage caused by mechanical contact. SOLUTION: In the mold with the pattern formed by a fine uneven shape, alignment marks for determining the relative positional relationship between the substrate and the mold are attached in the shape of a concentric circle to at least two spots. From the positional information or the shape on/of each mark, a broken mark is identified and excluded, and the alignment between the mold and the substrate coated with a resin film is carried out. COPYRIGHT: (C)2011,JPO&INPIT
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