发明名称 WASHING TRAY
摘要 PROBLEM TO BE SOLVED: To surely remove chips easily remaining on the periphery and end faces of a substrate without damaging the substrate. SOLUTION: The washing tray 1 of the substrate A is formed by integrating a set tray 2 storing the substrate A in a storing part 5 formed by stretching linear materials 7 with a net tray 9 formed by stretching a plurality of linear materials 11, and rockably holds the substrate A stored in the storing part 5 of the set tray 2. Therefore, even if the substrate rocks greatly in the storing part by a high pressure blown washing medium, the impact to the substrate is sufficiently buffered by the linear materials stretched in both trays, causing no damage to the substrate, to surely remove the chips attached to the periphery and end faces of the substrate. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011139990(A) 申请公布日期 2011.07.21
申请号 JP20100001894 申请日期 2010.01.07
申请人 CYBER GIKEN:KK 发明人 KOMANO HIDEO;NGUYEN VAN TRIET;YANAGIMOTO MACHIKO
分类号 B08B11/02 主分类号 B08B11/02
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