发明名称 FLUID DELIVERY MECHANISM FOR VACUUM WAFER PROCESSING SYSTEM
摘要 The fluid delivery mechanism of the present disclosure provides a solution for use in a single axis of motion that allows the connection of one or more fluid flow paths over a wide range of temperatures into a vacuum environment. The mechanism does not employ flexible tubing that is prone to fatigue, especially at very low temperatures. In one embodiment, a tube is axially moved within a sealed piston to allow for fluid delivery. In a second embodiment, bellows are used to provide the required functionality. In another embodiment, it is possible to achieve movement in two or more axis of motion by utilizing two or more appropriately configured mechanisms.
申请公布号 KR20110084209(A) 申请公布日期 2011.07.21
申请号 KR20117009974 申请日期 2009.09.29
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 FISH ROGER B.;MITCHELL ROBERT J.
分类号 H01L21/02;H01L21/265 主分类号 H01L21/02
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