| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coloring photosensitive composition which is excellent in suppressing changes in chromaticity in a formed color film, enables formation of a pattern having excellent solvent resistance, and is suitably used for formation of a color pattern of a color filter. <P>SOLUTION: The coloring photosensitive composition contains at least (A) a pigment having a phthalocyanine skeleton, (B) a solvent, (C) at least one kind selected from a group composed of a polymerizable monomer and a binder resin, (D) a photopolymerization initiator, and (E) an oxidizing agent expressed by general formula (1). In general formula (1), R<SP>1</SP>and R<SP>2</SP>each independently represent a hydrogen atom, halogen atom, 1-30C aliphatic group, aromatic group, aliphatic oxy group, aromatic oxy group or hetero group, and R<SP>1</SP>and R<SP>2</SP>may be bonded at each end to form a cyclic structure. <P>COPYRIGHT: (C)2011,JPO&INPIT |
