发明名称 METHOD OF FORMING CIRCUIT INTERCONNECTION, CIRCUIT BOARD, AND CIRCUIT INTERCONNECTION FILM HAVING FILM THICKNESS LARGER THAN WIDTH THEREOF
摘要 A method of forming a circuit interconnection on a circuit board includes: forming a trench that corresponds to a shape of the circuit interconnection on an interconnection base material that forms the circuit interconnection; distributing a catalyst for forming a conductive layer on the trench; and forming a conductive circuit interconnection film that forms the circuit interconnection by distributing a plating solution in a range that includes the trench and depositing a conductive material from the plating solution through the catalyst for forming the conductive layer.
申请公布号 US2011174528(A1) 申请公布日期 2011.07.21
申请号 US201113008335 申请日期 2011.01.18
申请人 SEIKO EPSON CORPORATION 发明人 KAMAKURA TOMOYUKI
分类号 H05K1/11;H01B5/00;H05K3/12 主分类号 H05K1/11
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