发明名称 |
METHOD OF FORMING CIRCUIT INTERCONNECTION, CIRCUIT BOARD, AND CIRCUIT INTERCONNECTION FILM HAVING FILM THICKNESS LARGER THAN WIDTH THEREOF |
摘要 |
A method of forming a circuit interconnection on a circuit board includes: forming a trench that corresponds to a shape of the circuit interconnection on an interconnection base material that forms the circuit interconnection; distributing a catalyst for forming a conductive layer on the trench; and forming a conductive circuit interconnection film that forms the circuit interconnection by distributing a plating solution in a range that includes the trench and depositing a conductive material from the plating solution through the catalyst for forming the conductive layer.
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申请公布号 |
US2011174528(A1) |
申请公布日期 |
2011.07.21 |
申请号 |
US201113008335 |
申请日期 |
2011.01.18 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KAMAKURA TOMOYUKI |
分类号 |
H05K1/11;H01B5/00;H05K3/12 |
主分类号 |
H05K1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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