发明名称 |
Creep-resistant polishing pad window |
摘要 |
The polishing pad is useful for polishing at least one of magnetic, optical and semiconductor substrates. The polishing pad includes a polishing layer having a polyurethane window. The polyurethane window has a cross-linked structure formed with an aliphatic or cycloaliphatic isocyanate and a polyol in a prepolymer mixture. The prepolymer mixture is reacted with a chain extender having OH or NH2 groups and having an OH or NH2 to unreacted NCO stoichiometry less than 95%. The polyurethane window has a time dependent strain less than or equal to 0.02% when measured with a constant axial tensile load of 1 kPa at a constant temperature of 60° C. at 140 minutes, a Shore D hardness of 45 to 90 and an optical double pass transmission of at least 15% at a wavelength of 400 nm for a sample thickness of 1.3 mm.
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申请公布号 |
US2011177758(A1) |
申请公布日期 |
2011.07.21 |
申请号 |
US20100657202 |
申请日期 |
2010.01.15 |
申请人 |
LOYACK ADAM;NAKATANI ALAN;KULP MARY JO;KELLY DAVID G |
发明人 |
LOYACK ADAM;NAKATANI ALAN;KULP MARY JO;KELLY DAVID G. |
分类号 |
B24B49/00;B24D11/00 |
主分类号 |
B24B49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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