发明名称 SYSTEM AND METHOD FOR PATTERN EVALUATION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To process an image of an evaluation object pattern at a high speed and also to improve the efficiency of computer resources. SOLUTION: A distributed computing system 1 is equipped with an image capture device 10 which captures a series of images Img1-Imgn of the evaluation object pattern picked up by CD-SEM 300 in a time of Ti per sheet, cluster nodes CN1-CNM which process the images Img1-Imgn in a series in a time of Tp per sheet and output the result of evaluation of the evaluation object pattern and a main node MN which is connected with the cluster nodes CN1-CNM and controls them. Herein the time Ti and the time Tp are measured and the cluster nodes CN1-CNm (m≤M) are estimated and assigned to a series of image processing so that the time for acquisition of the images Img1-Imgn and the processing time therefor may be in accord. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011141206(A) 申请公布日期 2011.07.21
申请号 JP20100002173 申请日期 2010.01.07
申请人 TOSHIBA CORP 发明人 MITSUI TADASHI
分类号 G01B15/04;G01N23/225;G06F9/48;G06T1/20;H01L21/66 主分类号 G01B15/04
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