| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method where hydrogen gas serving as a purge gas to be used for recovering hydrogen chloride in the by-product hydrogen chloride-containing exhaust gas to be discharged from a process for allowing hydrogen to react with trichlorosilane to produce polysilicone, is treated and utilized as a hydrogen source. <P>SOLUTION: A method for treating purged exhaust gas includes: a step (1) where the exhaust gas discharged from a production process of polysilicone, is passed through an activated carbon layer to adsorb hydrogen chloride; a step (2) where hydrogen gas serving as the purge gas is passed through the hydrogen chloride-adsorbed/held activated carbon layer to desorb the adsorbed hydrogen chloride; a step (3) where the purged exhaust gas containing the desorbed hydrogen chloride and hydrogen is passed through a chlorination column packed with e.g. a chlorination catalyst such as a Pd/SiO<SB>2</SB>catalyst to convert the hydrogenated chlorosilane contained in the purged exhaust gas into silicon tetrachloride; and a step (4) where the purged exhaust gas containing the converted silicon tetrachloride is brought into contact with a hydrogen chloride-absorbing solution such as a sodium hydroxide aqueous solution to remove hydrogen chloride and silicon tetrachloride. The purged exhaust gas obtained by the method for treating purged exhaust gas can be utilized as the hydrogen source for other production processes such as a fumed silica production process. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
