PLASMA ION IMPLANTATION PROCESS FOR PATTERNED DISC MEDIA APPLICATIONS
摘要
Processes and apparatus of forming patterns including magnetic and non-magnetic domains on a magnetically susceptible surface on a substrate are provided. In one embodiment, a method of forming a pattern of magnetic domains on a magnetically susceptible material disposed on a substrate includes exposing a first portion of a magnetically susceptible layer to a plasma formed from a gas mixture, wherein the gas mixture includes at least a halogen containing gas and a hydrogen containing gas for a time sufficient to modify a magnetic property of the first portion of the magnetically susceptible layer exposed through a mask layer from a first state to a second state.
申请公布号
WO2011056815(A3)
申请公布日期
2011.07.21
申请号
WO2010US55206
申请日期
2010.11.03
申请人
APPLIED MATERIALS, INC.;HILKENE, MARTIN A.;SCOTNEY-CASTLE, MATTHEW D.;GOUK, ROMAN;VERHAVERBEKE, STEVEN
发明人
HILKENE, MARTIN A.;SCOTNEY-CASTLE, MATTHEW D.;GOUK, ROMAN;VERHAVERBEKE, STEVEN