| 摘要 |
A hydrogen peroxide composition comprises hydrogen peroxide, a stabilizer system comprising a colloidal stannate, at least one acidifying agent or a salt thereof selected from the group consisting of sulfur-containing acidifying agents, nitric acid, and mixtures and salts thereof. Optionally, the hydrogen peroxide composition comprises an organic phosphonic acid or a salt thereof, such as amino-phosphonate, and/or a free radical scavenger, such as salicylic acid. A cleaning formulation comprises the hydrogen peroxide composition, a pH adjusting agent, and optionally other additives, such as surfactants. The cleaning formulation may be made by mixing the hydrogen peroxide or a precursor thereof, water, colloidal stannate, and at least one acidifying agent, and optionally, adjusting the pH to achieve an alkaline pH. |
