| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for forming a colored layer, which prevents pattern edge chipping or undercut even under low exposure and severe developing conditions, as well as undissolved materials remaining in development. <P>SOLUTION: The radiation sensitive composition for forming a colored layer contains a photoradical generator comprising (A) a coloring agent, (B) an alkali-soluble polymer resin, (C) a polyfunctional monomer, and (D) an oxime-based compound selected from a group of two kinds of compounds with different structures, and a biimidazole-based compound. The ratio of using the biimidazole-based compound is 10-30 wt.% to the total with the oxime-based compound component selected from the group of two kinds of compounds with different structures. <P>COPYRIGHT: (C)2011,JPO&INPIT |
