发明名称 COATING COMPOSITION INCLUDING POLYSILAZANE
摘要 PROBLEM TO BE SOLVED: To provide a coating composition that has superior burying and coating properties, and can form a siliceous film having superior film properties, and to provide a method of forming the siliceous film using the coating composition. SOLUTION: The coating composition includes perhydropolysilazane and a solvent, and a molecular weight distribution curve of the perhydropolysilazane has local maximums in a molecular weight range of 800 to 2,500 and a molecular weight range of 3,000 to 8,000, respectively, and the ratio Mw/Mn between weight average molecular weight Mw and number-average molecular weight Mn is 6 to 12. By performing the coating on a substrate having a gap of the coating composition and performing the heating at temperature equal to or lower than 1,000°C, the siliceous film buried up to a gap deep part can be formed. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011142207(A) 申请公布日期 2011.07.21
申请号 JP20100001883 申请日期 2010.01.07
申请人 AZ ELECTRONIC MATERIALS KK 发明人 HAYASHI MASANOBU
分类号 H01L21/316;C08G77/62;C09D5/25;C09D7/12;C09D183/16;H01L21/76 主分类号 H01L21/316
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