| 发明名称 |
IMPROVEMENTS FOR RAPID PROTOTYPING APPARATUS |
| 摘要 |
A stereolithography apparatus and an exposure system for a stereolithography apparatus, wherein light emitting diodes are used as light sources. The invention relates to aligning light from the light emitting diode and to the exchange and control of the light emitting diodes. |
| 申请公布号 |
KR20110084155(A) |
申请公布日期 |
2011.07.21 |
| 申请号 |
KR20117004753 |
申请日期 |
2009.10.09 |
| 申请人 |
HUNTSMAN ADVANCED MATERIALS(SWITZERLAND) GMBH |
发明人 |
POGEUOISE EMILIE;LARSEN NIELS HOLM;GRELIN JEROME;HANGAARD OLE |
| 分类号 |
B29C67/00;B29C35/08 |
主分类号 |
B29C67/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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