发明名称 LASER APPARATUS, PHOTOTHERAPY APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND OBJECT INSPECTION APPARATUS
摘要 <p>A fundamental wavelength light generating unit generates light of a fundamental wavelength in accordance with an output wavelength instruction signal. An optical amplifier unit amplifies the light of the fundamental wavelength. A wavelength converting part includes nonlinear optical crystals that each perform wavelength conversion and temperature regulators that each regulate the temperature of the corresponding nonlinear optical crystal, wherein the wavelength converting part converts the light amplified by the optical amplifier unit to light of the wavelength indicated by the output wavelength instruction signal. A storage unit stores correspondence information that indicates a correspondence relationship between the wavelength of the output light and the temperature of each of the nonlinear optical crystals based on the corresponding wavelength. A control unit controls each of the temperature regulators such that the temperature of the corresponding nonlinear optical crystal reaches the temperature to be set in accordance with the output wavelength instruction signal.</p>
申请公布号 KR20110084232(A) 申请公布日期 2011.07.21
申请号 KR20117010638 申请日期 2009.10.07
申请人 NIKON CORPORATION 发明人 TAKADA YASUTOSHI;TOKUHISA AKIRA
分类号 G02F1/39;H01S3/10 主分类号 G02F1/39
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