发明名称 |
Power system for sterilization systems employing low frequency plasma |
摘要 |
<p>The present invention provides a sterilization system that includes a low frequency power feedback control system for controllably adjusting a power applied to a low frequency plasma within a vacuum chamber of the sterilization system to remove gas or vapor species from the article. The power has a frequency of from 0 to approximately 200 kHz. The low frequency power feedback control system includes a power monitor adapted to produce a first signal indicative of the power applied to the low frequency plasma within the vacuum chamber. The low frequency power feedback control system further includes a power control module adapted to produce a second signal in response to the first signal from the power monitor, and a power controller adapted to adjust, in response to the second signal, the power applied to the low frequency plasma to maintain a substantially stable average power applied to the low frequency plasma while the article is being processed.</p> |
申请公布号 |
EP1192953(B1) |
申请公布日期 |
2011.07.20 |
申请号 |
EP20010308363 |
申请日期 |
2001.10.01 |
申请人 |
ETHICON, INC. |
发明人 |
AGAMOHAMADI, MITCH;CHOPERENA, ALFREDO M.;PLATT, ROBERT C., JR.;LEMUS, ANTHONY |
分类号 |
A61L2/14;A61L2/18;A61L2/20;A61L2/24;B01J19/08;H01J37/32;H05H1/24;H05H1/46 |
主分类号 |
A61L2/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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