MANUFACTURING METHOD FOR THE HIGH RESOLUTION ORGANIC THIN FILM PATTERN

摘要

PURPOSE: A method for forming an organic thin film pattern with high resolution is provided to optically lift off a sacrificial layer to form a pattern, thereby easily forming an organic thin film pattern of high resolution. CONSTITUTION: A first organic layer(130) is formed on a substrate(110). Light energy is irradiated onto the first organic layer to selectively eliminate the first organic layer. A sacrificial layer is formed on a part where the first organic layer remains. A second organic layer is formed on the substrate and the sacrificial layer. The second organic layer is lifted off to form a second organic layer pattern.