| 摘要 |
<p>PURPOSE: A substrate cleaning device and a method thereof are provided to grind and clean an erected substrate, thereby increasing cleaning efficiency. CONSTITUTION: A cleaning chamber(110) provides a space where a substrate(10) is ground and cleaned. A substrate transfer unit(120) transfers the substrate. The substrate transfer unit comprises a plurality of transfer rollers and a belt. Guide units(180a,180b) maintain the leveling of the substrate which is vertically transferred by the substrate transfer unit. The guide units comprise a guide shaft(182) and a guide roller(184).</p> |
