发明名称 APPARATUS FOR RINSING A SUBSTRATE
摘要 PURPOSE: A substrate rinse device is provided to spray air onto a substrate, thereby preventing rinse liquid from deviating from entering an entrance area. CONSTITUTION: A rinse chamber(110) comprises a rinse processing space. A substrate transfer unit(120) horizontally transfers a substrate using transfer rollers in the rinse chamber. A spray unit(130) includes a plurality of nozzles for spraying rinse liquid onto the substrate. An air knife(140) sprays air onto the substrate to prevent rinse liquid from entering an entrance area. A drain unit(150) drains rinse liquid from the substrate.
申请公布号 KR20110082291(A) 申请公布日期 2011.07.19
申请号 KR20100002199 申请日期 2010.01.11
申请人 SEMES CO., LTD. 发明人 PARK, MOON HO;IN, EUI SIK;LEE, WOO SONG
分类号 H01L21/302 主分类号 H01L21/302
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