发明名称 Transistor production using semiconductor printing fluid
摘要 A transistor is formed by applying modifier coatings to source and drain contacts and/or to the channel region between those contacts. The modifier coatings are selected to adjust the surface energy pattern in the source/drain/channel region such that semiconductor printing fluid is not drawn away from the channel region. For example, the modifier coatings for the contacts can be selected to have substantially the same surface energy as the modifier coating for the channel region. Semiconductor printing fluid deposited on the channel region therefore settles in place (due to the lack of a surface energy differential) and forms a relatively thick active semiconductor region between the contacts. Alternatively, the modifier coatings can be selected to have lower surface energies than the modifier coating in the channel region, which actually causes semiconductor printing fluid to be drawn towards the channel region.
申请公布号 US7980195(B2) 申请公布日期 2011.07.19
申请号 US20070957384 申请日期 2007.12.14
申请人 PALO ALTO RESEARCH CENTER INCORPORATED 发明人 CHABINYC MICHAEL L.;ARIAS ANA C.
分类号 B05C5/02;H01L51/05;B05C3/12;H01L21/208;H01L21/336;H01L21/77;H01L21/84;H01L29/786;H01L31/20;H01L51/00 主分类号 B05C5/02
代理机构 代理人
主权项
地址