发明名称 |
Substrate processing apparatus and method of removing particles |
摘要 |
A liquid within a processing tank is caused to overflow, and the overflowing liquid is circulated by a circulation system. In this process, bubbles are discharged into the liquid within the processing tank. Thus, particles within the processing tank are not only carried along by a flow of the liquid but also attach to the bubbles to be carried with the bubbles outwardly of the processing tank. A dip-type substrate processing apparatus removes the particles within the processing tank in a short time with efficiency.
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申请公布号 |
US7981286(B2) |
申请公布日期 |
2011.07.19 |
申请号 |
US20050226640 |
申请日期 |
2005.09.14 |
申请人 |
DAINIPPON SCREEN MFG CO., LTD. |
发明人 |
HIGUCHI AYUMI;ARAI KENICHIRO |
分类号 |
C02F1/24;B01D19/00;B08B3/04;B08B3/10;B08B3/14;H01L21/304 |
主分类号 |
C02F1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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