| 摘要 |
PURPOSE: A wafer etching apparatus is provided to irradiate ultraviolet rays on a wafer stored in an inside of an etching bath by irradiating the ultraviolet rays on the outside by sealing one side of the etching bath with quartz. CONSTITUTION: A bath body includes an open upper surface and an open front surface. A coupling unit is formed at a front opening part. A quartz plate is coupled with the coupling unit of the bath body to close a front surface part of the bath body. A UV generator is positioned at a front part of the bath body. The UV generator irradiates ultraviolet rays through the quartz plate to an inside of the bath body in which an etching solution is stored. A coupling protrusion is formed along a periphery at the front opening part of the bath body. A plurality of bolt holes are formed at the coupling protrusion. A plurality of bolt holes are formed at the quartz plate so that the bath body and the quartz plate are coupled by bolts and nuts. A gasket having a bolt hole is formed between the protrusion of the bath body and the quartz plate.
|
